10 µm process

From Wikipedia, the free encyclopedia

CMOS manufacturing
processes

10 µm
3 µm
1.5 µm
1 µm
800 nm (0.80 µm)
600 nm (0.60 µm)
350 nm (0.35 µm)
250 nm (0.25 µm)
180 nm (0.18 µm)
130 nm (0.13 µm)
90 nm
65 nm
45 nm
32 nm (Double Patterning)
22 nm (End of Planar Bulk CMOS)
16 nm (Transition to Nanoelectronics)
11 nm (Nanoelectronics)

The 10 µm process (10 µm or 10000 nm) refers to the level of semiconductor process technology that was reached around 1971-1972 timeframe by the leading semiconductor companies, like Intel.

[edit] Products featuring 10 µm manufacturing process

Intel 4004 CPU launched in 1971 was manufactured using this process.
Intel 8008 CPU launched in 1972 was manufactured using this process.

Preceded by -	CMOS manufacturing processes	Succeeded by 3 µm process

Categories: Condensed matter physics | International Technology Roadmap for Semiconductors lithography nodes | 1971 introductions

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10 µm process

From Wikipedia, the free encyclopedia

[edit] Products featuring 10 µm manufacturing process

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